Company Filing History:
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Years Active: 2016-2024
Title: Kevin Shi - Innovator in Leak Detection and Semiconductor Technology
Introduction
Kevin Shi is a prominent inventor based in Shanghai, China. He has made significant contributions to the fields of leak detection and semiconductor technology. With a total of 2 patents, his work showcases innovative methods that enhance the efficiency and reliability of various technologies.
Latest Patents
Kevin Shi's latest patents include a method for leak detection and a method for semiconductor selective etching and BSI image sensor. The leak detection patent describes a comprehensive approach for sensing leaks in a unit under test. This method involves scanning a SKU, connecting the unit to a testing apparatus, and monitoring vacuum pressure until it reaches a test pressure. The process includes delivering helium to detect leaks, with results displayed on a graphical user interface. His second patent focuses on selectively etching a semiconductor device and manufacturing a BSI image sensor. This method utilizes an HNA solution to achieve a uniform thickness in the etched semiconductor device.
Career Highlights
Throughout his career, Kevin Shi has worked with notable companies such as Ultra Clean Holdings, Inc. and Semiconductor Manufacturing International Corporation. His experience in these organizations has allowed him to refine his skills and contribute to groundbreaking technologies in the semiconductor industry.
Collaborations
Kevin has collaborated with talented individuals like Gethin Mao and Jaya Chandran. These partnerships have fostered innovation and have been instrumental in the development of his patented technologies.
Conclusion
Kevin Shi is a remarkable inventor whose work in leak detection and semiconductor technology has made a significant impact. His innovative patents and career achievements reflect his dedication to advancing technology in meaningful ways.