Villard Bonnot, France

Kevin Quinquinet


Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2024

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1 patent (USPTO):Explore Patents

Title: Kevin Quinquinet: Innovator in Film Thickness Measurement

Introduction

Kevin Quinquinet is a notable inventor based in Villard Bonnot, France. He has made significant contributions to the field of optical measurement, particularly in the area of film thickness distribution of wafers with thin films. His innovative approach has led to the development of a unique method that enhances the accuracy of film thickness measurements.

Latest Patents

Quinquinet holds a patent for a method that involves determining the height of focus using an optical microscope with an autofocus function. This method utilizes irradiation light of a specific wavelength to adjust the focus and obtain observation images of thin films. The process includes calculating the standard deviation of reflected-light intensity distribution and correcting the autofocus function to improve measurement accuracy. His patent is titled "Method for measuring film thickness distribution of wafer with thin films" and represents a significant advancement in optical measurement technology.

Career Highlights

Throughout his career, Kevin Quinquinet has worked with prominent companies in the semiconductor industry. He has been associated with Shin-Etsu Handotai Co., Ltd. and Unity Semiconductor Corporation, where he contributed to various projects that focused on enhancing semiconductor manufacturing processes. His expertise in optical measurement has been instrumental in driving innovation within these organizations.

Collaborations

Quinquinet has collaborated with notable professionals in his field, including Susumu Kuwabara and Philippe Gastaldo. These collaborations have allowed him to exchange ideas and further develop his innovative methods in film thickness measurement.

Conclusion

Kevin Quinquinet's contributions to the field of optical measurement and his innovative patent demonstrate his commitment to advancing technology in the semiconductor industry. His work continues to influence the way film thickness is measured, showcasing the importance of innovation in scientific research and development.

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