Company Filing History:
Years Active: 2013-2014
Title: Kevin J Hooker: Innovator in Mask Design and Device Manufacture
Introduction
Kevin J Hooker is a notable inventor based in Hillsboro, OR (US). He has made significant contributions to the field of semiconductor manufacturing through his innovative designs and methodologies. With a total of 2 patents, Hooker has established himself as a key figure in the industry.
Latest Patents
His latest patents include advancements in mask design and optical proximity correction (OPC) for device manufacture. These patents describe a comprehensive approach to mask design and modeling for a set of masks that are successively imaged to print a composite pattern on substrates, such as semiconductor wafers. The methods outlined in his patents include double patterning a substrate with the set of masks, correcting drawn patterns based on predicted contours, and modeling resist profile contours for mask levels. Additionally, he has developed methods for predicting resist profiles of Boolean operations involving two masks.
Career Highlights
Kevin J Hooker is currently employed at Intel Corporation, where he continues to push the boundaries of semiconductor technology. His work has been instrumental in enhancing the efficiency and accuracy of device manufacturing processes.
Collaborations
Throughout his career, Hooker has collaborated with talented individuals such as Shem Ogadhoh and Raguraman Venkatesan. These collaborations have further enriched his work and contributed to the success of various projects.
Conclusion
Kevin J Hooker is a prominent inventor whose work in mask design and device manufacture has made a lasting impact on the semiconductor industry. His innovative patents and collaborations highlight his commitment to advancing technology.