Company Filing History:
Years Active: 2000-2003
Title: Kevin Hsieh: Innovator in Photolithography and Silicide Processes
Introduction
Kevin Hsieh, an accomplished inventor based in Hsinchu Hsien, Taiwan, has made significant contributions to the field of semiconductor technology. With a total of three patents to his name, his work primarily focuses on innovative methods that enhance the efficiency of semiconductor manufacturing processes.
Latest Patents
Hsieh's latest patents include a sophisticated method of photolithography and a self-aligned silicide process. The photolithography method involves the formation of an anti-reflective coating on a conductive layer, followed by a nitrogen plasma treatment. A photo-resist layer is then applied and patterned on the anti-reflective coating, allowing for precise defining and removal processes. This technique optimizes the clarity and quality of semiconductor device patterns.
The self-aligned silicide process, on the other hand, relates to the formation of metal silicide layers on transistors. This patent details the steps taken, including the formation of a thin metal layer, a first rapid thermal process to create a first metal silicide layer, and further processes that transform the metal silicide layers to achieve lower resistance values. Such innovations significantly improve the performance of semiconductor devices.
Career Highlights
Hsieh is currently affiliated with United Microelectronics Corporation, a leading global semiconductor foundry. His role within the company allows him to explore and refine cutting-edge technologies that adhere to the ever-evolving demands of the semiconductor market. Through his research and patent developments, Hsieh has positioned himself as an integral part of the industry.
Collaborations
Throughout his career, Hsieh has collaborated with notable colleagues, including Wen-Yi Hsieh and Kun-Chih Wang. These partnerships have not only fostered innovation within their projects but also contributed to the advancement of semiconductor technologies at a broader scale.
Conclusion
Kevin Hsieh's contributions to the field of semiconductor technology, demonstrated through his innovative patent work, reflect his dedication to enhancing manufacturing processes. His latest developments in photolithography and silicide processes exemplify the continuous progress in the industry, marking him as a significant figure to watch in the world of inventions and innovations.