Location History:
- Littleton, MA (US) (2004)
- Camillus, NY (US) (2017)
- Dallas, TX (US) (2020)
- Harvard, MA (US) (2009 - 2023)
Company Filing History:
Years Active: 2004-2023
Title: **Inventor Spotlight: Kevin Gerard Donahue**
Introduction
Kevin Gerard Donahue, an innovative inventor based in Littleton, MA, holds a remarkable portfolio of 11 patents. His work primarily focuses on advanced optical technologies, with innovative methods and systems that enhance illumination devices through cutting-edge photolithography techniques.
Latest Patents
Among his most recent inventions are two notable patents:
1. **Transparent Illumination Photolithography Methods and Systems** - This invention outlines a method for creating a one-way see-through illumination device that utilizes a light guide and a precisely patterned surface of pixels. The process incorporates forming pixel wells through photolithography on the light guide's surface, enabling the generation of transparent illumination by manipulating total internal reflection of light.
2. **Maskless Photolithography Devices, Methods, and Systems** - This patent describes a device equipped with a light source and a light guide, where the light source emits photoresist-curative electromagnetic radiation. The light guide directs this radiation via total internal reflection, utilizing a specialized pattern of emission points to facilitate the release of light through frustration of total internal reflection.
Career Highlights
Kevin has significantly contributed to his field through his work with companies such as Nanopath, Inc. His inventions have pushed the boundaries of photolithography, showcasing his commitment to continually advancing optical technology.
Collaborations
Throughout his career, Kevin has collaborated with notable professionals, including Jack Raffel and Robert J. Caldicott. These partnerships have enriched his work, leading to innovative breakthroughs in photolithography and illumination systems.
Conclusion
Kevin Gerard Donahue's contributions to the field of photolithography illustrate his remarkable dedication to innovation. With an impressive number of patents under his name, his work continues to influence advancements in optical technology, making him a significant figure in the inventor community.