The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 31, 2023
Filed:
Mar. 27, 2019
Applicant:
Nanopath, Inc., Leominster, MA (US);
Inventor:
Kevin Donahue, Harvard, MA (US);
Assignee:
NANOPATH, INC., Leominster, MA (US);
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/20 (2006.01); F21V 8/00 (2006.01); G03F 7/16 (2006.01); G03F 7/26 (2006.01); G03F 1/50 (2012.01); H01L 21/027 (2006.01);
U.S. Cl.
CPC ...
G03F 7/7035 (2013.01); G02B 6/0011 (2013.01); G02B 6/0035 (2013.01); G02B 6/0036 (2013.01); G02B 6/0051 (2013.01); G03F 1/50 (2013.01); G03F 7/16 (2013.01); G03F 7/2004 (2013.01); G03F 7/2051 (2013.01); G03F 7/26 (2013.01); G03F 7/7015 (2013.01); G03F 7/70108 (2013.01); G03F 7/70283 (2013.01); H01L 21/0274 (2013.01);
Abstract
A device () includes a light source () and a light guide (). The light source () is configured to emit photoresist-curative electromagnetic radiation. The light guide () is arranged to receive the photoresist-curative electromagnetic radiation from the light source () and to guide the received radiation by total internal reflection, the light guide () including a pattern of emission points () on at least one surface of the light guide (), the emission points () emitting the photoresist-curative electromagnetic radiation out of the light guide () by frustration of total internal reflection caused by the emission points ().