The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 10, 2023
Filed:
Mar. 22, 2019
Applicant:
Nanopath, Inc., Leominster, MA (US);
Inventor:
Kevin Donahue, Harvard, MA (US);
Assignee:
NanoPath, Inc., Leominster, MA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
F21V 8/00 (2006.01); G02C 11/04 (2006.01); G02B 5/02 (2006.01); G02B 27/01 (2006.01);
U.S. Cl.
CPC ...
G02B 6/0055 (2013.01); G02B 5/02 (2013.01); G02B 27/0172 (2013.01); G02C 11/04 (2013.01);
Abstract
A method of forming a one-way see-through illumination device including a light guide and a pattern of pixels on a surface of the light guide. The method includes forming pixel wells corresponding to the pixels, via a formation method including photolithography, on the surface of the light guide. The pixels, including a light diffusing layer and a light reflecting layer, are formed using the pixel wells, wherein the pattern of pixels and the light guide are arranged to generate transparent illumination by the frustration of total internal reflection of light injected into the light guide.