Location History:
- Hillsboro, OR (US) (1996)
- Portland, OR (US) (1997)
Company Filing History:
Years Active: 1996-1997
Title: Kevin F. Carmody: Innovator in Semiconductor Technology
Introduction
Kevin F. Carmody is a notable inventor based in Hillsboro, OR (US), recognized for his contributions to semiconductor technology. He holds 2 patents that showcase his innovative approaches to solving complex challenges in the field.
Latest Patents
Carmody's latest patents include a process for eliminating the effects of polysilicon stringers in semiconductors. This process involves forming diversionary paths in overhangs to ensure that stringers do not interfere with circuit operation. For instance, in the formation of floating gate memory arrays, gaps are created in the first polysilicon lines to divert stringers formed from the second polysilicon layer, thus preventing parasitic paths from causing shorts between adjacent word lines.
Another significant patent is a method for etching silicon oxide films in a reactive ion etch system. This method utilizes a fluorine-helium-oxygen gas mixture to etch insulating films while minimizing gate oxide damage. By ensuring that the flow of helium is at least 20% of the total gas flows, the etch chemistry achieves a more uniform etch and reduces the risk of gate charging.
Career Highlights
Carmody is currently employed at Intel Corporation, where he applies his expertise in semiconductor fabrication. His work has significantly impacted the efficiency and reliability of semiconductor devices.
Collaborations
Throughout his career, Carmody has collaborated with esteemed colleagues such as Peter K. Charvat and Gilroy J. Vandentop, contributing to advancements in semiconductor technology.
Conclusion
Kevin F. Carmody's innovative patents and contributions to the semiconductor industry highlight his role as a key inventor in this field. His work continues to influence the development of more efficient and reliable semiconductor devices.