The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 17, 1997
Filed:
Jan. 17, 1995
Kevin F Carmody, Portland, OR (US);
Theodore C Lemmond, Beaverton, OR (US);
Intel Corporation, Santa Clara, CA (US);
Abstract
A process for eliminating the effects of parasitic paths from stringers by forming diversionary paths in the overhangs in which the stringers are formed. The diversionary paths are selected such that the stringers formed in these paths are harmless to the operation of the circuit. For instance, in the formation of floating gate memory array where first and second polysilicon lines are formed are right angles to each other and then the first lines are etched in alignment with the second line to form the floating gates the invention is implemented by forming gaps in the first lines between the second lines. In this way, stringers formed from the second polysilicon layer are diverted. Consequently, the parasitic paths are paths in parallel with the second lines (word lines) instead of shorts between adjacent word lines.