San Diego, CA, United States of America

Kevin Early

This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: Illumina Corporation. Active years: 2026.

USPTO Granted Patents = 1 

% Patents Active = 100.0

Average Co-Inventor Count = 6.0

ph-index = 1


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Kevin Early - Innovator in Focus Quality Metrics

Introduction

Kevin Early is an accomplished inventor based in San Diego, CA. He has made significant contributions to the field of imaging technology, particularly in the area of focus quality metrics. His innovative work has led to the development of a unique patent that enhances the performance of imaging systems.

Latest Patents

Kevin Early holds a patent titled "Sequencer focus quality metrics and focus tracking for periodically patterned surfaces." This patent describes the generation and use of a focus quality metric that is intensity independent. In one example, the focus quality metric is generated by acquiring an image of a patterned surface of a flow cell and processing it to generate a Fourier transform of the respective image data. A discrete Fourier transform may be applied to a sub-region of an image of a patterned flow cell surface, allowing for the derivation of a focus quality metric that is independent of intensity.

Career Highlights

Kevin Early has established himself as a key figure in the field of imaging technology. His work at Illumina Corporation has been instrumental in advancing the capabilities of imaging systems. With a focus on innovation, he continues to push the boundaries of what is possible in this domain.

Collaborations

Kevin has collaborated with notable colleagues such as Thomas A Baker and Siqi Zhang. Their combined expertise has contributed to the success of various projects within the company.

Conclusion

Kevin Early is a prominent inventor whose work in focus quality metrics has made a lasting impact on imaging technology. His innovative patent and collaborations with esteemed colleagues highlight his dedication to advancing the field.

Profile summary based on public USPTO records.
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