Company Filing History:
Years Active: 2011-2014
Title: Kevin E Cooper: Innovator in Semiconductor Cleaning Technologies
Introduction
Kevin E Cooper is a notable inventor based in Weatherford, TX (US), recognized for his contributions to semiconductor cleaning technologies. With a total of 2 patents, he has made significant advancements in the field, particularly in the cleaning of circuit substrates.
Latest Patents
One of his latest patents is an "Apparatus for cleaning of circuit substrates." This invention involves a scrubber-type apparatus designed to clean silicon wafers effectively. It incorporates measures to address differential cleaning of the wafer's central region by utilizing rotary brushes with non-contact portions or by adjusting the relative position of the wafer and brushes. Additionally, it allows for the preferential direction of cleaning fluids towards the wafer's central area. Another innovative aspect of this patent includes the use of rollers instead of brushes, with various cleaning materials interposed between the rollers and the substrate.
Another significant patent by Cooper is the "Immersion lithography apparatus and method of performing immersion lithography." This invention features an optical system equipped with a liquid delivery unit that applies a layer of immersion liquid onto a wafer's surface. It also includes a barrier liquid that prevents gas ingress into the immersion liquid, enhancing the lithography process.
Career Highlights
Throughout his career, Kevin E Cooper has worked with prominent companies in the semiconductor industry, including Freescale Semiconductor, Inc. and NXP B.V. His experience in these organizations has contributed to his expertise in developing innovative cleaning technologies for circuit substrates.
Collaborations
Cooper has collaborated with notable professionals in his field, including Scott Warrick and Janos Farkas. These collaborations have likely enriched his work and led to further advancements in semiconductor technologies.
Conclusion
Kevin E Cooper's contributions to semiconductor cleaning technologies through his patents demonstrate his innovative spirit and commitment to advancing the industry. His work continues to influence the field, making significant strides in the efficiency and effectiveness of circuit substrate cleaning methods.