Freescale Semiconductor,inc.

Nxp B.v.

Kevin E Cooper

Janos Farkas

Srdjan Kordic

Sebastien Petitdidier

Scott Warrick

Jan Van Hassel

Sébastien Petitdidier

Jan Van-Hassel

Silicon wafers and the like are cleaned using new scrubber-type apparatus in which measures are taken to compensate for differential cleaning of the central region of the wafer by: using rotary brushes having one or more non-contact portions arranged in the section thereof that faces the central region of the substrate, or toggling the relative position of the wafer and the rotary brushes, or directing cleaning fluid(s) preferentially towards the central region of the wafer. Another aspect of the invention provides scrubber-type cleaning apparatus in which the rotary brushes are replaced by rollers (). A web of cleaning material () is interposed between each roller and the substrate. Various different webs of cleaning material may be used, e.g. a length of tissue, a continuous loop of cleaning material whose surface is reconditioned on each cleaning pass, adhesive material provided on a carrier tape, etc.

Apparatus for cleaning of circuit substrates

An immersion lithography apparatus includes an optical system having a liquid delivery unit. The liquid delivery unit is arranged to deliver a layer of an immersion liquid onto a surface of a wafer as well as an annulus of a barrier liquid adjacent an exterior wall of the immersion liquid. The presence of the barrier liquid prevents ingress to the immersion liquid of a gas external to the immersion liquid.

Immersion lithography apparatus and method of performing immersion lithography

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Weatherford, TX, United States of America

Kevin E Cooper