The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 17, 2014
Filed:
Apr. 20, 2005
Janos Farkas, Saint Ismier, FR;
Srdjan Kordic, Biviers, FR;
Sebastien Petitdidier, Gieres, FR;
Kevin E Cooper, Weatherford, TX (US);
Jan Van Hassel, Crolles Cedex, FR;
Janos Farkas, Saint Ismier, FR;
Srdjan Kordic, Biviers, FR;
Sebastien Petitdidier, Gieres, FR;
Kevin E Cooper, Weatherford, TX (US);
Jan Van Hassel, Crolles Cedex, FR;
Freescale Semiconductor, Inc., Austin, TX (US);
Abstract
Silicon wafers and the like are cleaned using new scrubber-type apparatus in which measures are taken to compensate for differential cleaning of the central region of the wafer by: using rotary brushes having one or more non-contact portions arranged in the section thereof that faces the central region of the substrate, or toggling the relative position of the wafer and the rotary brushes, or directing cleaning fluid(s) preferentially towards the central region of the wafer. Another aspect of the invention provides scrubber-type cleaning apparatus in which the rotary brushes are replaced by rollers (). A web of cleaning material () is interposed between each roller and the substrate. Various different webs of cleaning material may be used, e.g. a length of tissue, a continuous loop of cleaning material whose surface is reconditioned on each cleaning pass, adhesive material provided on a carrier tape, etc.