Jan Van Hassel

Title: Innovations by Jan Van Hassel in Circuit Substrate Cleaning

Introduction

Jan Van Hassel is an accomplished inventor based in Crolles, France. He has made significant contributions to the field of semiconductor technology, particularly in the cleaning of circuit substrates. His innovative approach has led to the development of a unique apparatus that enhances the cleaning process of silicon wafers.

Latest Patents

Jan Van Hassel holds a patent for an "Apparatus for cleaning of circuit substrates." This invention addresses the challenges associated with the differential cleaning of the central region of silicon wafers. The apparatus utilizes rotary brushes with non-contact portions to effectively clean the substrate. Additionally, it incorporates methods such as toggling the relative position of the wafer and brushes, as well as directing cleaning fluids preferentially towards the central region. Another aspect of his invention includes the use of rollers instead of brushes, with various types of cleaning materials interposed between the rollers and the substrate.

Career Highlights

Jan Van Hassel is currently employed at Freescale Semiconductor, Inc., where he continues to innovate in the semiconductor industry. His work has not only advanced cleaning technologies but has also contributed to the overall efficiency of semiconductor manufacturing processes.

Collaborations

Throughout his career, Jan has collaborated with notable colleagues, including Janos Farkas and Srdjan Kordic. These collaborations have fostered a creative environment that encourages the exchange of ideas and technological advancements.

Conclusion

Jan Van Hassel's contributions to the field of circuit substrate cleaning exemplify the importance of innovation in semiconductor technology. His patented apparatus represents a significant step forward in improving cleaning processes, ultimately benefiting the industry as a whole.