Haverhill, MA, United States of America

Kevin Barbera

This inventor holds 1 USPTO granted patent. Top assignee: Asmpt Nexx, Inc.. Active years: 2023.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Kevin Barbera. Retrieved from https://idiyas.com/inventor/kevin-barbera-rh86nw3p

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1


Company Filing History:


Years Active: 2023

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1 patent (USPTO):Explore Patents

Title: Kevin Barbera – Innovator in Semiconductor Technology

Introduction

Kevin Barbera is a notable inventor located in Haverhill, MA, with a specific focus on semiconductor technology. With one patent to his name, he has contributed significantly to innovations in the field.

Latest Patents

Kevin Barbera's latest invention is titled "Substrate support features and method of application." This patent outlines a method for applying raised features to a semiconductor substrate chuck, where each feature serves to space a substrate from the chuck during use. The detailed steps of this method are essential for enhancing the efficiency and effectiveness of semiconductor manufacturing processes.

Career Highlights

Currently, Kevin Barbera is affiliated with ASMP Nexx, Inc., where he utilizes his expertise in semiconductor innovations. His work is instrumental in advancing the technology that supports modern electronics and integrates into various applications worldwide.

Collaborations

Throughout his career, Kevin has collaborated with fellow professionals, including I-Kuan Lin and Arthur Sommerstein. Their teamwork has fostered an environment of innovation, contributing to the development of new methodologies and technologies in the semiconductor sector.

Conclusion

Kevin Barbera stands as a prominent figure in the field of semiconductor technology, with his innovative patent reflecting his commitment to excellence. His contributions are invaluable in shaping the future of the industry, making him a respected inventor and collaborator.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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