Cliffside Park, NJ, United States of America

Kevin B Schesing

This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: New York University. Active years: 2017.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Kevin B Schesing. Retrieved from https://idiyas.com/inventor/kevin-b-schesing

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 1 

Average Co-Inventor Count = 4.0

ph-index = 1


Company Filing History:


Years Active: 2017

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1 patent (USPTO):Explore Patents

Title: Kevin B Schesing: Innovator in Polymer Pen Lithography

Introduction

Kevin B Schesing is a notable inventor based in Cliffside Park, NJ (US). He has made significant contributions to the field of polymer technology, particularly through his innovative work in Polymer Pen Lithography. His research focuses on enhancing the fabrication processes of polymer tip arrays, which are essential in various applications.

Latest Patents

Kevin holds a patent titled "Systems and methods for polymer tips using silanated supports." This patent describes materials that maintain the simplicity characteristic of poly(dimethyl siloxane) tip arrays while ensuring control over feature dimensions. The invention also explores the mechanical properties of different materials in relation to Polymer Pen Lithography printing. He has 1 patent to his name.

Career Highlights

Kevin is affiliated with New York University, where he continues to advance his research in polymer technologies. His work has garnered attention for its potential applications in various scientific and industrial fields.

Collaborations

Throughout his career, Kevin has collaborated with esteemed colleagues, including Adam B Braunschweig and Xiao Zhong. These partnerships have contributed to the development and refinement of his innovative ideas.

Conclusion

Kevin B Schesing is a prominent figure in the realm of polymer technology, with a focus on enhancing Polymer Pen Lithography. His contributions and collaborations reflect his commitment to advancing this field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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