The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 11, 2017
Filed:
Nov. 19, 2013
Applicant:
New York University, New York, NY (US);
Inventors:
Adam B. Braunschweig, New York, NY (US);
Xiao Zhong, Jersey City, NJ (US);
Kevin B. Schesing, Cliffside Park, NJ (US);
Shudan Bian, New York, NY (US);
Assignee:
NEW YORK UNIVERSITY, New York, NY (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B05D 1/28 (2006.01); G03F 7/00 (2006.01); G03F 7/20 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0002 (2013.01); G03F 7/2049 (2013.01);
Abstract
Polymer Pen Lithography materials that retain the simplicity characteristic for the fabrication of poly(dimethyl siloxane) tip arrays while preserving the control over feature dimensions and to understand the role of the mechanical properties of the different materials on Polymer Pen Lithography printing.