Keun Sam Jang

Title: Innovations by Keun Sam Jang in CMP Slurry Composition

Introduction

Keun Sam Jang is an accomplished inventor based in Suwon-si, South Korea. He has made significant contributions to the field of chemical mechanical polishing (CMP) through his innovative patent. His work focuses on enhancing the efficiency and effectiveness of polishing copper films, which is crucial in various electronic applications.

Latest Patents

Keun Sam Jang holds a patent for a CMP slurry composition specifically designed for copper films. The patent, titled "CMP slurry composition for copper films and method of polishing copper films using the same," includes a unique composition that features a polar solvent or a non-polar solvent. Additionally, it incorporates polishing particles modified with a silicon-containing compound, represented by a specific formula. This innovation aims to improve the polishing process of copper films, making it more efficient and effective.

Career Highlights

Keun Sam Jang is currently employed at Samsung SDI Co., Inc., where he continues to work on advancements in CMP technology. His expertise in this area has positioned him as a valuable asset to the company and the industry as a whole. With a focus on innovation, he has contributed to the development of new materials and processes that enhance the performance of electronic components.

Collaborations

Keun Sam Jang has collaborated with notable colleagues, including Hyeong Mook Kim and Dong Hun Kang. Their combined efforts in research and development have led to significant advancements in CMP technology, further solidifying their contributions to the field.

Conclusion

Keun Sam Jang's innovative work in CMP slurry composition demonstrates his commitment to advancing technology in the electronics industry. His patent and ongoing contributions highlight the importance of innovation in improving manufacturing processes.