Tokyo, Japan

Kesahiro Koike

This inventor holds 7 USPTO granted patents. Top assignee: Hoya Corporation. Active years: 2000-2010.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Kesahiro Koike. Retrieved from https://idiyas.com/inventor/kesahiro-koike

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 85.7

Average Co-Inventor Count = 2.0

ph-index = 5

Forward Citations = 56(Granted Patents)


Location History:

  • Ohizumi-mura, JP (2000)
  • Tokyo, JP (2005 - 2010)

Company Filing History:


Years Active: 2000-2010

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7 patents (USPTO):Explore Patents

Title: The Innovative Contributions of Kesahiro Koike

Introduction

Kesahiro Koike is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of glass substrate production, particularly in the context of mask blanks. With a total of 7 patents to his name, Koike's work has had a substantial impact on the industry.

Latest Patents

One of Koike's latest patents is a method of producing a glass substrate for a mask blank by polishing with an alkaline polishing liquid that contains colloidal silica abrasive grains. This innovative method involves polishing the surface of the glass substrate using an alkaline polishing liquid, which helps to suppress the occurrence of an alkali metal gel substance protrusion adhered to the glass substrate. The process includes a surface roughness control step to achieve a predetermined surface roughness, followed by a protrusion suppressing step to minimize polishing rates and fine convex protrusions. Another notable patent is a method of producing a glass substrate for a mask blank that includes measuring the convex/concave profile of the surface, controlling the flatness of the surface, and executing local machining based on the degree of convexity. This method also incorporates acid treatment before the polishing step to enhance the quality of the glass substrate.

Career Highlights

Koike is currently employed at Hoya Corporation, a leading company in the optical and imaging industry. His work at Hoya has allowed him to focus on advancing technologies related to glass substrates and mask blanks. His innovative approaches have contributed to the company's reputation for excellence in precision optics.

Collaborations

Throughout his career, Koike has collaborated with notable colleagues, including Masato Ohtsuka and Yasutaka Tochihara. These collaborations have fostered a creative environment that encourages the development of cutting-edge technologies in their field.

Conclusion

Kesahiro Koike's contributions to the field of glass substrate production are noteworthy and reflect his dedication to innovation. His patents and work at Hoya Corporation demonstrate his commitment to advancing technology in the optical industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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