The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 03, 2000

Filed:

Mar. 31, 1998
Applicant:
Inventors:

Tsutomu Shoki, Hachioji, JP;

Kesahiro Koike, Ohizumi-mura, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F / ; G21K / ;
U.S. Cl.
CPC ...
430-5 ; 378 35 ;
Abstract

A surface of a silicon carbide film which is an x-ray membrane 12 is made so that the surface roughness thereof may be 1.0 nm or less in terms of Ra (center-line average roughness) and the surface may have no scratch of 0.25 .mu.m or more in width. The surface of the silicon carbide film, which is the x-ray membrane 12 is polished a diamond particle, of a predetermined particle diameter, and colloidal silica dispersed in a solution containing hydrogen peroxide as an abrasive material, so that the surface is highly precise.


Find Patent Forward Citations

Shoki, Tsutomu. (2000). X-ray membrane for x-ray mask, x-ray mask blank, x-ray mask, (U.S. Patent No. 6127068). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6127068

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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