Keon Young Kim

Title: Keon Young Kim and Semiconductor Substrate Cleaning

Introduction

Keon Young Kim is an inventor located in Icheon, South Korea. His patent work concerns cleaning processes for semiconductor-device substrates, particularly the challenge of protecting delicate, high-aspect-ratio patterns during wet cleaning.

Latest Patents

The provided information identifies one patent associated with Kim: “Cleaning Agent Composition for Substrate for Semiconductor Devices and Method for Cleaning Substrate for Semiconductor Devices Using the Same.” The disclosure describes a cleaning composition containing a silicon-based compound represented by Formula 1 and an aprotic organic solvent with a dielectric constant of 10 or less. The composition can form a protective film on the substrate surface, helping prevent pattern collapse during wet cleaning of fine, high-aspect-ratio structures. The disclosed approach aims to support semiconductor manufacturing processes with improved yield. Kim is credited with 1 patent in the information provided.

Career Highlights

The supplied career information associates Kim with EnF Technology Co., Ltd. and SK hynix Inc. His patent reflects work on a manufacturing challenge in which cleaning must remove contaminants while preserving fragile semiconductor patterns.

Collaborations

The provided information names Hye Ji Kim and JinHo You as Kim’s coworkers. Their specific roles in the patent or related work are not stated.

Conclusion

Keon Young Kim’s identified patent focuses on protecting fine semiconductor patterns during substrate cleaning, addressing a process concern relevant to manufacturing yield.