Company Filing History:
Years Active: 2022
Title: Kento Ogata: Innovator in Substrate Processing Technology
Introduction
Kento Ogata is a notable inventor based in Koshi, Japan. He has made significant contributions to the field of substrate processing technology. His innovative approach has led to the development of a unique apparatus that enhances the efficiency of substrate processing.
Latest Patents
Kento Ogata holds a patent for a substrate processing apparatus. This apparatus includes a cover member that surrounds a substrate held by a rotary holder. It features a collecting member placed in an exhaust path formed between the cover member and the rotary holder. Additionally, a solvent supply is positioned above the collecting member, designed to supply a solvent to the collecting member. The solvent supply consists of an inner storage space surrounding the substrate, an outer storage space surrounding the inner storage space, and a partition wall that extends along the circumferential direction to separate the two storage spaces. Multiple communication holes penetrate the partition wall, allowing the solvent introduced into the outer storage space to flow into the inner storage space. Furthermore, multiple dripping holes in the bottom wall of the inner storage space enable the solvent to drop toward the collecting member. Kento Ogata has 1 patent to his name.
Career Highlights
Kento Ogata is associated with Tokyo Electron Limited, a leading company in the semiconductor and electronics manufacturing industry. His work at the company has been instrumental in advancing substrate processing technologies. His innovative designs and solutions have contributed to the company's reputation for excellence in the field.
Collaborations
Kento Ogata has collaborated with notable colleagues such as Satoshi Shimmura and Yuji Sakai. These collaborations have fostered a creative environment that encourages innovation and the development of cutting-edge technologies.
Conclusion
Kento Ogata is a distinguished inventor whose work in substrate processing technology has made a significant impact. His patent for a substrate processing apparatus showcases his innovative thinking and dedication to advancing technology in the industry. His contributions continue to influence the field and inspire future innovations.