Kentaro Tokuri

Title: Kentaro Tokuri: Innovator in Substrate Processing Technology

Introduction

Kentaro Tokuri is a prominent inventor based in Kyoto, Japan. He has made significant contributions to the field of substrate processing, holding a total of 5 patents. His innovative approaches have advanced the efficiency and effectiveness of substrate treatment methods.

Latest Patents

Tokuri's latest patents include a substrate processing apparatus and a substrate processing method. In his substrate processing apparatus, chemical-solution processing is performed by supplying a chemical solution to the upper surface of a substrate while the top plate is positioned at a first relative position. Additionally, cleaning processing is conducted by supplying a cleaning liquid to the upper surface of the substrate with the top plate at a second relative position, which is closer to the substrate than the first. Furthermore, dry processing is executed by rotating the substrate with the top plate at a third relative position, which is even closer to the substrate than the second. This innovative design allows for the efficient removal of the chemical atmosphere above the substrate during cleaning, thereby minimizing the occurrence of particles during dry processing.

Another notable patent is the substrate treating apparatus, which holds and rotates a substrate in a substantially horizontal position. This apparatus features a control unit that manages a rinsing liquid supply mechanism, a gas knife mechanism that sprays gas onto the substrate to create a gas spraying zone, and a rinsing liquid mechanism that supplies rinsing liquid downstream from the gas spraying zone. A drying unit is also included to dry the substrate by rotating it.

Career Highlights

Throughout his career, Kentaro Tokuri has worked with notable companies, including Dainippon Screen Manufacturing Co., Ltd. His experience in these organizations has contributed to his expertise in substrate processing technologies.

Collaborations

Tokuri has collaborated with talented individuals such as Hiroyuki Araki and Kenya Morinishi, further enhancing his innovative work in the field.

Conclusion

Kentaro Tokuri's contributions to substrate processing technology through his patents and collaborations highlight his role as a key innovator in this specialized field. His work continues to influence advancements in substrate treatment methods.