The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 25, 2007

Filed:

Oct. 25, 2005
Applicants:

Kentaro Tokuri, Kyoto, JP;

Kenya Morinishi, Kyoto, JP;

Masaki Iwami, Kyoto, JP;

Inventors:

Kentaro Tokuri, Kyoto, JP;

Kenya Morinishi, Kyoto, JP;

Masaki Iwami, Kyoto, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B05B 15/04 (2006.01); B05C 11/02 (2006.01);
U.S. Cl.
CPC ...
Abstract

An apparatus causes a substrate to rotate and supplies a treatment liquid to a substrate surface to make a treatment, without concern that a mixed substance is eluted from a cup in the use for a long time, or a thin film comes off from an inside wall surface to be contamination-causing substances even if the cup made of a water-repellent material for collecting a treatment liquid becomes hydrophilic. A cupdisposed to surround the sides and underside of a substrate W rotating while being held by a spin chuck, and serving to collect a treatment liquid diffused from the substrate to the surroundings, is made of a plastic material. Further, an inside wall surface of an upper-side cup partof the cup, being a portion on which the treatment liquid having been diffused from the substrate impinges, is roughened to be a hydrophilic surface.


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