Tokyo, Japan

Kentaro Asano

This inventor holds 2 USPTO granted patents and 2 published patent applications. Top assignee: Ebara Corporation. Active years: 2023-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Kentaro Asano. Retrieved from https://idiyas.com/inventor/kentaro-asano

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 2 

% Patents Active = 50.0

Average Co-Inventor Count = 11.0

ph-index = 1


Company Filing History:


Years Active: 2023-2026

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2 patents (USPTO):Explore Patents

Title: Kentaro Asano - Innovator in Substrate Processing Technology

Introduction

Kentaro Asano is a prominent inventor based in Tokyo, Japan. He is known for his contributions to substrate processing technology, particularly in the development of advanced apparatuses that enhance manufacturing processes.

Latest Patents

Kentaro Asano holds a patent for a substrate processing apparatus. This innovative apparatus includes a polishing section and a transport section. The polishing section features a first polishing unit, a second polishing unit, and a transport mechanism. Each polishing unit is equipped with multiple polishing apparatuses, which are designed to perform efficient and effective polishing processes.

Career Highlights

Asano has made significant strides in his career, particularly through his work at Ebara Corporation. His expertise in substrate processing has positioned him as a key figure in the field, contributing to advancements that benefit various industries.

Collaborations

Kentaro Asano has collaborated with notable colleagues, including Kuniaki Yamaguchi and Hiroshi Shimomoto. These partnerships have fostered innovation and have led to the development of cutting-edge technologies in substrate processing.

Conclusion

Kentaro Asano's work in substrate processing technology exemplifies his commitment to innovation and excellence. His contributions continue to influence the industry and pave the way for future advancements.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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