Kenta Ono

Title: Kenta Ono: Innovator in Substrate Processing Technologies

Introduction

Kenta Ono is a prominent inventor based in Miyagi, Japan, known for his significant contributions to substrate processing technologies. With a total of six patents to his name, Ono has developed innovative methods and apparatuses that enhance the efficiency and precision of substrate processing.

Latest Patents

Ono's latest patents include a substrate processing method and a substrate processing apparatus. One exemplary embodiment of his substrate processing method involves providing a substrate that includes a carbon-containing film, an intermediate film, and a tin-containing film with an opening pattern. The method consists of a first etching process that uses the tin-containing film as a mask to transfer the opening pattern to the intermediate film, followed by a second etching process that employs plasma formed from a processing gas to remove the tin-containing film and etch the carbon-containing film. The processing gas includes hydrogen, halogen or carbon, and oxygen.

Another notable patent is his plasma processing method and apparatus, which allows for precise control over the dimensions of an opening. This method includes providing a substrate with an etching target layer and a mask layer, forming a deposition layer on the mask layer, and etching the deposition layer using plasma generated from a first process gas. This innovative approach enables the partial etching of the etching target layer, enhancing the overall processing capabilities.

Career Highlights

Throughout his career, Kenta Ono has worked with notable companies such as Tokyo Electron Limited and Max Co., Ltd. His experience in these organizations has contributed to his expertise in substrate processing technologies and has allowed him to develop groundbreaking inventions.

Collaborations

Ono has collaborated with esteemed colleagues, including Shinya Ishikawa and Masanobu Honda. These partnerships have fostered a creative environment that has led to the development of innovative solutions in the field of substrate processing.

Conclusion

Kenta Ono's contributions to substrate processing technologies through his patents and collaborations highlight his role as a leading inventor in this field. His innovative methods and apparatuses continue to influence advancements in substrate processing, showcasing the importance of his work in the industry.