Location History:
- Hsinchu, TW (1999)
- Pin Dong Hsien, TW (2002)
Company Filing History:
Years Active: 1999-2002
Title: Kent Liao: Innovator in Semiconductor Technology
Introduction
Kent Liao is a prominent inventor based in Pin Dong Hsien, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of 2 patents. His innovative approaches have advanced the methods used in semiconductor fabrication.
Latest Patents
Kent Liao's latest patents include a "Process of eliminating a shallow trench isolation divot" and a "Method for using oxygen plasma treatment on a dielectric layer." The first patent outlines a comprehensive process for fabricating a shallow trench isolation structure, which involves several steps, including the formation of insulating layers and the deposition of silicon to enhance the trench's integrity. The second patent describes a method for evenly depositing a dielectric layer on a semiconductor device, utilizing oxygen plasma to ensure uniform thickness and eliminate charge distribution issues.
Career Highlights
Kent Liao is currently employed at Mosel Vitelic Corporation, where he continues to innovate in semiconductor technologies. His work has been instrumental in improving the efficiency and reliability of semiconductor devices.
Collaborations
Kent has collaborated with notable coworkers, including Dinos Huang and Tuby Tu, contributing to a dynamic and innovative work environment.
Conclusion
Kent Liao's contributions to semiconductor technology through his patents and collaborative efforts highlight his role as a key innovator in the industry. His work continues to influence advancements in semiconductor fabrication processes.