This inventor holds 4 USPTO granted patents. Top assignee: Fujitsu Corporation. Active years: 1981-1982.
Company Filing History:
Years Active: 1981-1982
Title: Kenro Kitamura: Innovator in Polymer Composition
Introduction
Kenro Kitamura is a notable inventor based in Fujisawa, Japan. He has made significant contributions to the field of polymer chemistry, particularly in the development of positive resist polymer compositions. With a total of 4 patents to his name, Kitamura's work has had a lasting impact on the industry.
Latest Patents
Among his latest patents, Kitamura has developed a positive resist polymer composition and a method of forming a resist pattern. This innovation includes a cross-linkable positive-working ionizing radiation-resist or ultraviolet ray-resist polymer composition. Another significant patent is the positive resist terpolymer composition and method of forming resist, which was filed under PCT No. PCT/JP78/00022. The PCT was filed on November 6, 1978, and published on May 31, 1979, under PCT Pub. No. WO79/00284.
Career Highlights
Kenro Kitamura is currently associated with Fujitsu Corporation, where he continues to advance his research and development efforts. His work has been instrumental in enhancing the capabilities of polymer compositions used in various applications.
Collaborations
Kitamura has collaborated with notable colleagues, including Yasuhiro Yoneda and Toshisuke Kitakohji. These partnerships have fostered innovation and contributed to the success of their projects.
Conclusion
Kenro Kitamura's contributions to polymer chemistry and his innovative patents highlight his role as a leading inventor in the field. His work continues to influence advancements in technology and materials science.