Fujitsu Corporation

Kenro Kitamura

Yasuhiro Yoneda

Toshisuke Kitakohji

Jiro Naito

A cross-linkable positive-working ionizing radiation-resist or ultraviolet ray-resist polymer composition including: in polymerized form,

Positive resist polymer composition and method of forming resist pattern

PCT No. PCT/JP78/00022 Sec. 371 Date July 7, 1979 Sec. 102(e) Date July 2, 1979 PCT Filed Nov. 6, 1978 PCT Pub. No. WO79/00284 PCT Pub. Date May 31, 1979 A cross-linkable positive-working ionizing radiation-resist or ultraviolet ray- resist polymer composition including: in polymerized form,

Positive resist terpolymer composition and method of forming resist

PCT No. PCT/JP78/00021 Sec. 371 Date July 2, 1979 Sec. 102(e) Date July 7, 1979 PCT Filed Nov. 6, 1978 PCT Pub. No. WO79/00283 PCT Pub. Date May 31, 1979 A cross-linkable positive-working ionizing radiation-resist or ultraviolet ray-resist polymer composition comprising, in polymerized form,

A negative type resist is provided for deep ultraviolet light lithography. This resist comprises a polymer of a diallyl ester of a dicarboxylic acid having a degree of dispersion of 3 or less, which is given by the ratio of a weight-average molecular weight Mw to a number-average molecular weight Mn. This deep UV resist can produce a fine detail resist pattern having a high resolution, and it has a high sensitivity to irradiating the coated film of the polymer on a substrate with deep UV light followed by development.

Growing community of inventors

Fujisawa, Japan

Kenro Kitamura