This inventor holds 1 USPTO granted patent. Top assignee: Battelle Memorial Institute. Active years: 2007.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2007
Title: Kenneth G Rappé: Innovator in Halogen Gas Treatment
Introduction
Kenneth G Rappé is a notable inventor based in Richland, WA (US). He has made significant contributions to the field of environmental technology, particularly in the treatment of halogen-containing gases. His innovative approaches aim to reduce the environmental impact of these gases through advanced processes.
Latest Patents
Kenneth G Rappé holds 1 patent for his work titled "Processes for treating halogen-containing gases." This patent discloses various processes, apparatuses, and systems designed to treat halogen-containing gases, such as fluorine. The invention involves generating a plasma to chemically reduce the halogen-containing gas into more environmentally manageable products. In one embodiment, a reducing agent is mixed with the halogen-containing gas to create a feed gas mixture, where a non-thermal plasma is generated in the presence of liquid water. Another embodiment describes mixing a vaporized portion of a liquid reducing agent with the halogen-containing gas to produce a reaction mixture, followed by generating a non-thermal plasma to facilitate the reduction process.
Career Highlights
Kenneth G Rappé is associated with the Battelle Memorial Institute, where he has contributed to various research initiatives. His work focuses on developing innovative solutions for environmental challenges, particularly in the treatment of hazardous gases.
Collaborations
Some of Kenneth G Rappé's coworkers include Christopher Lyle Aardahl and Rick J Orth. Their collaborative efforts contribute to advancing research and development in the field of gas treatment technologies.
Conclusion
Kenneth G Rappé's innovative work in treating halogen-containing gases showcases his commitment to environmental sustainability. His contributions through patented processes highlight the importance of developing effective solutions for managing hazardous materials.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
