The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 22, 2007
Filed:
Jan. 13, 2003
Christopher L. Aardahl, Sequim, WA (US);
Rick J. Orth, Kennewick, WA (US);
Kenneth G. Rappé, Richland, WA (US);
Delbert L. Lessor, Richland, WA (US);
Gary B. Josephson, Richland, WA (US);
Christopher L. Aardahl, Sequim, WA (US);
Rick J. Orth, Kennewick, WA (US);
Kenneth G. Rappé, Richland, WA (US);
Delbert L. Lessor, Richland, WA (US);
Gary B. Josephson, Richland, WA (US);
Battelle Memorial Institute, Richland, WA (US);
Abstract
There are disclosed various processes, apparatuses and systems for treating a halogen-containing gas such as Fthat involve generating a plasma in order to reduce chemically the halogen-containing gas into products that are more environmentally manageable. According to a particular embodiment, a reducing agent is mixed with the halogen-containing gas to produce a feed gas mixture and a non-thermal plasma is generated in the feed gas mixture in the presence of liquid water. According to another embodiment, a vaporized portion of a liquid reducing agent is mixed with the halogen-containing gas to produce a reaction mixture and a non-thermal plasma is generated in the reaction gas mixture to reduce the halogen-containing gas.