Kenneth D Mack

Title: **Kenneth D Mack: Innovator in Plasma Etching Technologies**

Introduction

Kenneth D Mack, an accomplished inventor based in Sunnyvale, California, holds a significant patent in the field of plasma etching. His innovative approach has contributed to advancements in etching processes, showcasing his expertise and dedication to scientific progress.

Latest Patents

Kenneth holds a patent for a "Method of plasma etching a substrate with a gaseous organohalide compound." This groundbreaking process involves first exposing the substrate to an etchant gas containing a volatile organohalide. Once the etch rate stabilizes, the organohalide is replaced with oxygen, resulting in an immediate increase in the substrate's etch rate. Repeating this method yields a substantially higher average etch rate, demonstrating the efficiency of his invention.

Career Highlights

Kenneth D Mack is associated with International Business Machines Corporation (IBM), a global leader in technology and innovation. His work at IBM exemplifies his commitment to advancing technology through inventive solutions. With one patent to his name, Kenneth's contributions are instrumental in enhancing plasma etching techniques.

Collaborations

Throughout his career, Kenneth has had the privilege of collaborating with talented individuals, including Suryadevara Vijayakumar Babu and Joseph G Hoffarth. Working alongside esteemed coworkers allows for the exchange of ideas and fosters an environment rich in innovation.

Conclusion

Kenneth D Mack stands out as a passionate inventor whose work in plasma etching has significant implications for various industries. His innovative methods and collaborative spirit reflect the essence of progress in technology, making him a noteworthy figure in the field of inventions.