Kenneth A Prygon

Title: Kenneth A. Prygon: Innovator in Chemical Mechanical Polishing Technology

Introduction

Kenneth A. Prygon is a notable inventor based in Bear, Delaware, who has made significant contributions to the field of chemical mechanical polishing. With a total of 2 patents, his work focuses on developing advanced polishing pads that enhance the manufacturing processes of semiconductor, optical, and magnetic substrates.

Latest Patents

Prygon's latest patents include innovations in polishing pad technology. One of his patents describes a chemical mechanical polishing pad that is suitable for planarizing various substrates. This polishing pad boasts an ultimate tensile strength of at least 3,000 psi (20.7 MPa) and features a polymeric matrix containing closed cell pores. The closed cell pores have an average diameter ranging from 1 to 50 micrometers and represent 1 to 40 volume percent of the polishing pad. The pad's texture is characterized by an exponential decay constant, τ, of 1 to 10 micrometers, resulting from the natural porosity of the polymeric matrix and a surface texture developed through periodic or continuous conditioning with an abrasive. Additionally, the surface texture has a characteristic half height half width, W, that is less than or equal to the value of τ.

Another significant patent involves porous polyurethane polishing pads, which are particularly useful for polishing semiconductor substrates. This porous polishing pad features a matrix formed from coagulated polyurethane and a non-fibrous polishing layer. The polishing surface of this layer has a pore count of at least 500 pores per mm, which decreases with the removal of the polishing layer. Furthermore, the polishing surface exhibits a surface roughness Ra between 0.01 and 3 micrometers.

Career Highlights

Kenneth A. Prygon is currently associated with Rohm and Haas Electronic Materials CMP Holdings, Inc., where he continues to innovate in the field of polishing technology. His work has been instrumental in advancing the efficiency and effectiveness of polishing processes in the semiconductor industry.

Collaborations

Throughout his career, Prygon has collaborated with notable colleagues, including Clyde A. Fawcett and T. Todd Crkvenac. These collaborations have contributed to the development of cutting-edge technologies in the field.

Conclusion

Kenneth A. Prygon stands out as a key figure in the innovation of chemical mechanical polishing technology.