Koshi-Machi, Japan

Kenji Urata


Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 4(Granted Patents)


Company Filing History:


Years Active: 2010

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1 patent (USPTO):Explore Patents

Title: Kenji Urata: Innovator in Liquid Processing Technology

Introduction

Kenji Urata is a notable inventor based in Koshi-Machi, Japan. He has made significant contributions to the field of liquid processing technology, particularly in the semiconductor industry. His innovative approach has led to the development of a unique method and apparatus for liquid processing.

Latest Patents

Kenji Urata holds a patent for a "Liquid processing method and liquid processing apparatus." This invention involves a nozzle unit equipped with processing-liquid nozzles A to J. An air layer and a solvent layer for processing liquid are successively formed outside a processing-liquid layer included in the tip of each nozzle. The solvent layer in nozzle A is thrown out into a drain part of a standby unit, and subsequently, the processing liquid is supplied from nozzle A to the surface of a wafer, performing a coating process. After completing the coating process, the processing liquid remaining in nozzle A is sucked, and the respective tips of the nozzles A to J are dipped into respective solvents in solvent reservoirs A to J. This process prevents dryness of the processing liquids in the respective nozzles while maintaining a compact nozzle unit.

Career Highlights

Kenji Urata is associated with Tokyo Electron Limited, a leading company in the semiconductor manufacturing equipment industry. His work has been instrumental in advancing liquid processing techniques, which are crucial for the production of high-quality semiconductor devices.

Collaborations

Kenji has collaborated with notable colleagues such as Tsunenaga Nakashima and Shinji Okada. Their combined expertise has contributed to the success of various projects within the company.

Conclusion

Kenji Urata's innovative contributions to liquid processing technology have made a significant impact in the semiconductor industry. His patent and collaborative efforts continue to influence advancements in this critical field.

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