Kenji Tanouchi

Title: Kenji Tanouchi: Innovator in Silicon Etching Technology

Introduction

Kenji Tanouchi is a prominent inventor based in Nirasaki, Japan. He has made significant contributions to the field of semiconductor technology, particularly in the area of silicon etching. His innovative methods have paved the way for advancements in the manufacturing of electronic devices.

Latest Patents

Kenji Tanouchi holds a patent for a method of etching silicon-containing film, which includes a computer-readable storage medium and an apparatus for etching silicon-containing film. This method involves etching the silicon-containing film formed on a substrate by using both a first fluorine-containing gas and a second fluorine-containing gas. The first gas includes at least an F gas, while the second gas includes at least a ClF gas, an I F gas, or an S F gas. This patent showcases his expertise in enhancing the efficiency and effectiveness of silicon etching processes. He has 1 patent to his name.

Career Highlights

Kenji Tanouchi is associated with Tokyo Electron Limited, a leading company in the semiconductor industry. His work at the company has been instrumental in developing cutting-edge technologies that improve the production of silicon-based devices. His innovative approaches have garnered recognition within the industry.

Collaborations

Throughout his career, Kenji has collaborated with notable colleagues, including Takehiko Orii and Yasuo Asada. These collaborations have contributed to the advancement of technology in the semiconductor field.

Conclusion

Kenji Tanouchi is a key figure in the innovation of silicon etching technology. His contributions have significantly impacted the semiconductor industry, and his work continues to influence future advancements.