Tokyo, Japan

Kenji Shirakawa


Average Co-Inventor Count = 3.7

ph-index = 1

Forward Citations = 111(Granted Patents)


Company Filing History:


Years Active: 2001-2025

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2 patents (USPTO):

Title: Kenji Shirakawa: Innovator in Query Processing and Plasma Technology

Introduction

Kenji Shirakawa is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the fields of query processing and plasma technology. With a total of 2 patents, his work showcases innovative methods that enhance efficiency and performance in various applications.

Latest Patents

One of Kenji Shirakawa's latest patents is titled "Method and database system for optimizing query processing execution scheme." This invention involves a method for executing query processing that generates a task graph indicating multiple task sequences. Each sequence is capable of performing query processing corresponding to a specific query. The method includes determining processing costs for each task sequence and selecting the most efficient one for execution.

Another notable patent is the "Plasma processing method and plasma processing apparatus." This invention features a plasma processing apparatus that includes a processing chamber formed by a vacuum vessel and a magnetic field forming coil. The apparatus is designed to uniformly process large-diameter wafers while reducing RIE lag in fine etching patterns.

Career Highlights

Throughout his career, Kenji Shirakawa has worked with notable companies, including Kioxia Corporation. His experience in these organizations has allowed him to develop and refine his innovative ideas, contributing to advancements in technology.

Collaborations

Kenji has collaborated with several talented individuals, including Minoru Hanazaki and Takayuki Ikushima. These collaborations have fostered a creative environment that has led to the development of groundbreaking technologies.

Conclusion

Kenji Shirakawa's contributions to query processing and plasma technology highlight his innovative spirit and dedication to advancing these fields. His patents reflect a commitment to improving efficiency and performance in technology applications.

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