Berlin, Germany

Kenji Shinoda

This inventor holds 1 USPTO granted patent. Top assignee: Fuji Photo Film Company, Limited. Active years: 2000.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Kenji Shinoda. Retrieved from https://idiyas.com/inventor/kenji-shinoda

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 3(Granted Patents)


Company Filing History:


Years Active: 2000

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1 patent (USPTO):Explore Patents

Title: Kenji Shinoda: Innovator in Photosensitive Lithography

Introduction

Kenji Shinoda is a notable inventor based in Berlin, Germany. He has made significant contributions to the field of lithography, particularly through his innovative patent related to photosensitive lithographic plates. His work has implications for the quality and efficiency of lithographic processes.

Latest Patents

Kenji Shinoda holds a patent for a photosensitive lithographic plate and the process for producing the same. This invention includes a photosensitive layer coated on the surface of a substrate, along with a mat layer formed on the photosensitive layer. The design features plural resinous protrusions on the back surface of the substrate, which help prevent deterioration of vacuum adhesion during the production process. This innovation ensures that a photosensitive lithographic plate with uniform quality is obtained, regardless of its wound position. He has 1 patent to his name.

Career Highlights

Kenji Shinoda is associated with Fuji Photo Film Company, Limited, where he has been able to apply his expertise in lithography. His work at this esteemed company has allowed him to contribute to advancements in photographic and printing technologies.

Collaborations

One of his notable collaborators is Yasuhito Naruse, with whom he has worked closely on various projects related to lithographic technology.

Conclusion

Kenji Shinoda's contributions to the field of photosensitive lithography highlight his innovative spirit and dedication to improving manufacturing processes. His patent serves as a testament to his expertise and the impact of his work in the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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