The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 29, 2000
Filed:
Jun. 03, 1998
Yasuhito Naruse, Shizuoka, JP;
Kenji Shinoda, Berlin, DE;
Fuji Photo Film Co., Ltd., Minami-Ashigara, JP;
Abstract
In a photosensitive lithographic plate including a photosensitive layer coated on the surface of a substrate and a mat layer formed on the photosensitive layer, plural resinous protrusions are provided on the back surface of the substrate in the form of a layer. Deterioration of vacuum adhesion due to the mat collapsed in a production process of a photosensitive lithographic plate including a step of winding is prevented, consequently, a photosensitive lithographic plate with uniform quality is obtained regardless of its wound position.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile