Kenji Komatsu

Title: Kenji Komatsu: Innovator in Substrate Processing Technology

Introduction

Kenji Komatsu is a notable inventor based in Nirasaki, Japan. He has made significant contributions to the field of substrate processing, holding a total of 3 patents. His work focuses on enhancing the efficiency and effectiveness of substrate processing methods and apparatuses.

Latest Patents

Kenji Komatsu's latest patents include innovative methods for substrate processing. One of his patents describes a substrate processing method performed in a chamber of a substrate processing apparatus. This method involves providing a substrate on a support, supplying a processing gas, and generating plasma through a combination of RF signals and negative DC voltage. The process is designed to be efficient, with a time for performing certain steps being 30 seconds or shorter.

Another significant patent focuses on surface modification control for etch metric enhancement. This method involves monitoring and controlling plasma-assisted surface modification processes. By acquiring optical emission spectra during the surface modification, the method allows for real-time adjustments to enhance the effectiveness of the process.

Career Highlights

Kenji Komatsu is associated with Tokyo Electron Limited, a leading company in the semiconductor manufacturing equipment industry. His work has contributed to advancements in substrate processing technologies, making him a key figure in this field.

Collaborations

Kenji has collaborated with notable coworkers such as Seiichi Watanabe and Brian J Coppa. Their combined expertise has furthered the development of innovative technologies in substrate processing.

Conclusion

Kenji Komatsu's contributions to substrate processing technology through his patents and work at Tokyo Electron Limited highlight his role as an influential inventor. His innovative methods continue to impact the industry positively.