Kenji Edamitsu

Title: Kenji Edamitsu: Innovator in Substrate Treatment Technologies

Introduction

Kenji Edamitsu is a prominent inventor based in Kyoto, Japan. He has made significant contributions to the field of substrate treatment technologies, holding a total of 8 patents. His innovative approaches have advanced the efficiency and effectiveness of substrate processing methods.

Latest Patents

Among his latest patents, Edamitsu has developed a substrate treating apparatus and a substrate treating method. The substrate treating apparatus features a process tank for storing treatment liquid, a chamber surrounding the process tank, a solvent vapor nozzle for supplying solvent vapor, and a cleaning liquid nozzle for delivering a cleaning liquid. The controller of the apparatus orchestrates immersion treatment, where a substrate is immersed in the treatment liquid, and dry treatment, where the substrate is dried using solvent vapor. Additionally, the cleaning liquid nozzle facilitates the cleaning of the chamber, ensuring optimal performance. The substrate processing method involves supplying a water repellent agent and dilute isopropyl alcohol to the substrate, followed by a drying process.

Career Highlights

Kenji Edamitsu has worked with notable companies such as Dainippon Screen Manufacturing Co., Ltd. and Screen Holdings Co., Ltd. His experience in these organizations has allowed him to refine his skills and contribute to groundbreaking technologies in substrate treatment.

Collaborations

Throughout his career, Edamitsu has collaborated with talented individuals, including Shigeru Yamamoto and Daiki Fujii. These partnerships have fostered innovation and have been instrumental in the development of his patented technologies.

Conclusion

Kenji Edamitsu's work in substrate treatment technologies exemplifies his commitment to innovation and excellence. His patents reflect a deep understanding of the complexities involved in substrate processing, making him a key figure in this field.