The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 18, 2025

Filed:

Jun. 02, 2023
Applicant:

Screen Holdings Co., Ltd., Kyoto, JP;

Inventors:

Shigeru Yamamoto, Kyoto, JP;

Takashi Akiyama, Kyoto, JP;

Daiki Fujii, Kyoto, JP;

Kenji Edamitsu, Kyoto, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/677 (2006.01); B08B 3/10 (2006.01); B08B 9/08 (2006.01); B08B 9/093 (2006.01); H01L 21/02 (2006.01); H01L 21/67 (2006.01);
U.S. Cl.
CPC ...
H01L 21/67034 (2013.01); B08B 3/10 (2013.01); B08B 9/08 (2013.01); B08B 9/093 (2013.01); H01L 21/67057 (2013.01); B08B 9/0933 (2013.01); H01L 21/02052 (2013.01); H01L 21/02057 (2013.01); H01L 21/67757 (2013.01);
Abstract

A substrate treating apparatus includes a process tank for storing a treatment liquid, a chamber for surrounding the process tank, a solvent vapor nozzle for supplying solvent vapor into the chamber, a cleaning liquid nozzle for supplying a cleaning liquid, and a controller. The controller causes immersion treatment, where a substrate is immersed in the treatment liquid stored in the process tank, to be performed for a preset period of time, and causes dry treatment, where the substrate processed with the treatment liquid and taken out of the process tank is dried with the solvent vapor supplied from the solvent vapor nozzle, to be performed. The controller causes the cleaning liquid nozzle to supply the cleaning liquid into the chamber and causes the process tank to be immersed in the cleaning liquid stored in the chamber, whereby the chamber cleaning treatment, where the chamber including an outer wall of the process tank is cleaned, is performed.


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