This inventor holds 1 USPTO granted patent. Top assignee: Japan Energy Corporation. Active years: 1997.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 1997
Title: Kenichirou Nakamura: Innovator in Sputtering Technology
Introduction
Kenichirou Nakamura is a notable inventor based in Kitaibaraki, Japan. He has made significant contributions to the field of sputtering technology, particularly through his innovative patent that enhances the quality and reliability of sputtering target assemblies.
Latest Patents
Nakamura holds a patent for a "Sputtering target assembly having solid-phase bonded interface." This invention involves a sputtering target assembly composed of a sputtering target and a backing plate, which may include inserts as necessary. The assembly is characterized by a solid-phase bonded interface that avoids the formation of an appreciable thermal diffusion layer. This ensures that the sputtering target maintains its quality characteristics, including metallurgical properties, intact. The assembly is created by bonding the target and backing plate at low temperatures and pressures under vacuum conditions. This method results in a bonded area percentage of 100%, free from non-bonded portions such as pores, while preserving the uniformity of the microstructure and crystal orientation of the target material.
Career Highlights
Nakamura is associated with Japan Energy Corporation, where he applies his expertise in sputtering technology. His work has contributed to advancements in materials science and engineering, particularly in the production of high-quality sputtering targets.
Collaborations
Nakamura has collaborated with notable colleagues, including Atsushi Fukushima and Masaru Nagasawa. Their combined efforts have furthered research and development in the field of sputtering technology.
Conclusion
Kenichirou Nakamura's innovative work in sputtering technology exemplifies the impact of dedicated inventors in advancing industrial applications. His patent reflects a significant step forward in ensuring the quality and reliability of sputtering target assemblies.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile