This inventor holds 1 USPTO granted patent. Top assignees: Chiyoda Kaushiki Kaisha, Showa Denko Kabushiki Kaisha. Active years: 1990.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
1 out of 1 
1 out of 405 Years Active: 1990
Title: Kenichiro Shiozawa: Innovator in Semiconductor Technology
Introduction
Kenichiro Shiozawa is a notable inventor based in Ashiya, Japan. He has made significant contributions to the field of semiconductor technology, particularly through his innovative patent related to polishing pads.
Latest Patents
Shiozawa holds a patent for a polishing pad designed specifically for semiconductor wafers. This polishing pad is made of a foamed fluorine-contained resin sheet, which provides high resistance to corrosive polishing solutions, such as those found in bromine-methanol systems or bromine-methanol-silica powder systems. His invention is crucial for enhancing the efficiency and effectiveness of semiconductor manufacturing processes.
Career Highlights
Throughout his career, Kenichiro Shiozawa has worked with prominent companies in the semiconductor industry. He has been associated with Showa Denko K.K. and Chiyoda K.K., where he has contributed to various projects and innovations in semiconductor technology.
Collaborations
Shiozawa has collaborated with several professionals in his field, including Masahiro Takiyama and Kunihiro Miyazaki. These collaborations have further enriched his work and have led to advancements in semiconductor manufacturing techniques.
Conclusion
Kenichiro Shiozawa's contributions to semiconductor technology, particularly through his patented polishing pad, highlight his innovative spirit and dedication to advancing the industry. His work continues to influence the field and improve manufacturing processes.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile