Kenichiro Sasamori

Title: Kenichiro Sasamori: Innovator in Sputtering Technology

Introduction

Kenichiro Sasamori is a notable inventor based in Miyagi, Japan. He has made significant contributions to the field of materials science, particularly in the development of advanced sputtering targets. His innovative work has led to the creation of a unique sintered sputtering target that enhances production efficiency and material quality.

Latest Patents

Sasamori holds a patent for a sputtering target and method for production thereof. This patent describes a sintered sputtering target characterized by an average crystallize size ranging from 1 nm to 50 nm. The target comprises an alloy with a three-component system or greater, primarily including elements such as Zr, Pd, Cu, Co, Fe, Ti, Mg, Sr, Y, Nb, Mo, Tc, Ru, Rh, Ag, Cd, In, Sn, Sb, Te, and a rare earth metal. The manufacturing process involves sintering atomized powder, resulting in a high-density target with an extremely fine and uniform structure. This method offers a cost-effective alternative to conventional bulk metal glass production, which typically requires high costs and results in a coarse crystal structure.

Career Highlights

Kenichiro Sasamori is currently employed at JX Nippon Mining & Metals Corporation, where he continues to advance his research and development efforts. His work has been instrumental in improving the efficiency and effectiveness of sputtering technology, which is crucial for various applications in electronics and materials engineering.

Collaborations

Sasamori has collaborated with notable colleagues, including Akihisa Inoue and Hisamichi Kimura. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas within the field.

Conclusion

Kenichiro Sasamori's contributions to sputtering technology exemplify the impact of innovative thinking in materials science. His patented work not only enhances production methods but also sets a new standard for quality in the industry.