The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 30, 2013
Filed:
Jul. 14, 2004
Akihisa Inoue, Miyagi, JP;
Hisamichi Kimura, Miyagi, JP;
Kenichiro Sasamori, Miyagi, JP;
Masataka Yahagi, Ibaraki, JP;
Atsushi Nakamura, Ibaraki, JP;
Hideyuki Takahashi, Ibaraki, JP;
Akihisa Inoue, Miyagi, JP;
Hisamichi Kimura, Miyagi, JP;
Kenichiro Sasamori, Miyagi, JP;
Masataka Yahagi, Ibaraki, JP;
Atsushi Nakamura, Ibaraki, JP;
Hideyuki Takahashi, Ibaraki, JP;
JX Nippon Mining & Metals Corporation, Tokyo, JP;
Abstract
A sintered sputtering target having a structure where the average crystallize size is 1 nm to 50 nm and preferably comprises an alloy having a three-component system or greater containing, as its primary component, at least one element selected from among Zr, Pd, Cu, Co, Fe, Ti, Mg, Sr, Y, Nb, Mo, Tc, Ru, Rh, Ag, Cd, In, Sn, Sb, Te and a rare earth metal. This target is manufactured by sintering atomized powder. Thereby provided is a high density target having an extremely fine and uniform structure manufactured with the sintering method, in place of a conventional bulk metal glass produced by the quenching of a molten metal, which has a coarse crystal structure and requires a high cost for its production.