Kanagawa-ken, Japan

Kenichiro Kaneko


Average Co-Inventor Count = 2.9

ph-index = 2

Forward Citations = 31(Granted Patents)


Location History:

  • Kanagawa-ken, JP (2002)
  • Kawasaki, JP (2002)

Company Filing History:


Years Active: 2002

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2 patents (USPTO):Explore Patents

Title: Kenichiro Kaneko: Innovator in Optical Technology

Introduction

Kenichiro Kaneko is a prominent inventor based in Kanagawa-ken, Japan. He has made significant contributions to the field of optical technology, particularly through his innovative patents. With a total of 2 patents, Kaneko's work has advanced the capabilities of projection optical systems.

Latest Patents

Kaneko's latest patents include a stage apparatus, projection optical apparatus, and exposure method. His inventions focus on improving the accuracy of flatness measurements and exposure processes in optical systems. The stage apparatus allows for precise measurement of the material support's position, correcting any displacement in the Z-direction during flatness measurement. Additionally, his exposure method involves measuring the tilt of a photosensitive substrate relative to the image plane, ensuring accurate pattern transfer from a mask to the substrate.

Career Highlights

Kenichiro Kaneko is associated with Nikon Corporation, a leading company in imaging and optical products. His work at Nikon has positioned him as a key player in the development of advanced exposure technologies. His innovative approaches have contributed to the efficiency and precision of device manufacturing processes.

Collaborations

Kaneko has collaborated with notable colleagues, including Masahiro Nei and Hiroki Tateno. These partnerships have fostered a collaborative environment that enhances the innovation process within Nikon Corporation.

Conclusion

Kenichiro Kaneko's contributions to optical technology through his patents have significantly impacted the industry. His work continues to influence advancements in projection optical systems and exposure methods.

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