The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 29, 2002
Filed:
Feb. 15, 2000
Applicant:
Inventors:
Masahiro Nei, Kawasaki, JP;
Kenichiro Kaneko, Kawasaki, JP;
Hiroki Tateno, Sakura, JP;
Jiro Inoue, Kawasaki, JP;
Naomasa Shiraishi, Urawa, JP;
Assignee:
Nikon Corporation, Tokyo, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03B 2/768 ; G03B 2/742 ; G03B 2/732 ;
U.S. Cl.
CPC ...
G03B 2/768 ; G03B 2/742 ; G03B 2/732 ;
Abstract
A method and apparatus for exposing an image of a pattern formed in a mask onto a sensitive substrate. The mask is irradiated with an irradiation light. Data is computed relating to the thermal expansion saturation point of the mask due to absorption of the irradiation light. The mask is expanded to the thermal expansion saturation point based on the computed data, and the image of the mask pattern is exposed onto the sensitive substrate.