Kenichi Shoji

Title: Kenichi Shoji and Semiconductor Manufacturing

Introduction

Kenichi Shoji is an inventor associated with Ibaraki, Japan, and Renesas Electronics Corporation. His patent work includes methods for manufacturing semiconductor devices. The supplied information lists 2 patents.

Latest Patents

The provided patent descriptions concern a manufacturing method for a semiconductor device. The method involves preparing a semiconductor substrate with a silicon nitride film on its rear surface, forming an interlayer insulating film with a via hole on the substrate’s main surface, and selectively forming a via-fill within the hole.

The process also includes cleaning the wafer’s rear surface to expose the silicon nitride film. After cleaning, a chemically amplified photoresist film is formed over the interlayer insulating film and via-fill. The description specifies storing the substrate in an atmosphere with an ammonium ion concentration of 1,000 μg/m or less.

The two supplied entries describe the same method, so they are presented here as one distinct patent subject rather than as separate inventions.

Career Highlights

Shoji’s listed work focuses on semiconductor fabrication, particularly substrate cleaning and photoresist processing. These steps are relevant to controlling conditions during the manufacture of semiconductor devices.

Collaborations

Shoji is associated with Renesas Electronics Corporation. The supplied information also names Katsuhiko Hotta and Kiyoshi Maeshima as coworkers, though it does not specify their roles in the patent work.

Conclusion

Kenichi Shoji’s listed patent activity centers on a semiconductor manufacturing method that coordinates wafer cleaning, via formation, and photoresist processing.