Kanagawa, Japan

Kenichi Oyama

This inventor holds 1 USPTO granted patent. Top assignee: Sony Corporation. Active years: 2006.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Kenichi Oyama. Retrieved from https://idiyas.com/inventor/kenichi-oyama-2e8859go

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 7(Granted Patents)


Company Filing History:


Years Active: 2006

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1 patent (USPTO):Explore Patents

Title: Kenichi Oyama: Innovator in Semiconductor Technology

Introduction

Kenichi Oyama is a notable inventor based in Kanagawa, Japan. He has made significant contributions to the field of semiconductor technology, particularly through his innovative patent related to heat treatment apparatuses.

Latest Patents

Kenichi Oyama holds a patent for a heat treatment apparatus and method for semiconductor wafers. This invention addresses the challenge of suppressing variations in line widths on the surface of semiconductor wafers. The apparatus includes a heating plate designed to heat the semiconductor wafer to a predetermined temperature. It features a temperature measuring unit that assesses temperatures across multiple regions of the wafer during the heating process. The controller then adjusts the heating and cooling temperatures based on these measurements, ensuring uniform treatment across the wafer.

Career Highlights

Kenichi Oyama is currently employed at Sony Corporation, where he continues to develop and refine technologies that enhance semiconductor manufacturing processes. His work has been instrumental in improving the efficiency and reliability of semiconductor devices.

Collaborations

Kenichi has collaborated with notable colleagues such as Atsushi Someya and Yuko Yamaguchi, contributing to advancements in their shared field of expertise.

Conclusion

Kenichi Oyama's innovative work in semiconductor technology exemplifies the importance of precision in manufacturing processes. His contributions continue to influence the industry and pave the way for future advancements.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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