Company Filing History:
Years Active: 1985
Title: Kenichi Kokubun: Innovator in Photoresist Material Technology
Introduction: Kenichi Kokubun, an inventor based in Fukushima, Japan, has made a significant contribution to the field of semiconductor manufacturing through his innovative work on photoresist materials. With one patent to his name, he exemplifies the creativity and dedication of engineers in advancing technology.
Latest Patents: Kenichi Kokubun's patent focuses on a specialized photoresist material that includes a polymer featuring chloromethyl groups and incorporates 2-isopropenylnaphthalene as a critical component. This invention boasts a carefully controlled average substitution degree of chloromethyl groups ranging from 0.2 to 5. Noteworthy for its high glass transition point, remarkable sensitivity to radiation, and excellent dry etching resistance, this photoresist material is particularly well-suited for manufacturing semiconductor elements through radiation. It also provides enhanced resolution during the etching process, a crucial aspect of semiconductor fabrication.
Career Highlights: Kenichi Kokubun is currently affiliated with Kureha Kagaku Kogyo Kabushiki Kaisha, a company renowned for its focus on advanced materials and innovative technologies. His work within this organization has not only contributed to the field of semiconductor manufacturing but has also positioned him as a key figure in the development of efficient materials that meet the demanding requirements of modern technology.
Collaborations: Throughout his career, Kenichi Kokubun has collaborated with talented professionals in his field, including notable coworkers Hideaki Doi and Teruo Sakagami. Such collaborations have enabled the pooling of knowledge and expertise, further driving innovation and progress within their projects.
Conclusion: Kenichi Kokubun's contributions to the field of photoresist materials underscore his important role as an inventor. With a focus on advancing semiconductor technology, his patented innovations reflect the ongoing pursuit of excellence in material science and engineering. His work continues to impact the industry, promoting better manufacturing processes and higher-quality semiconductor elements.